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Home > Metallized Aluminum Nitride Substrate for Laser Diode Array Manufacturing

Metallized Aluminum Nitride Substrate for Laser Diode Array Manufacturing

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Address: No.14 Shangwu Outer Ring Rd, New District, Zhengzhou, China.

  • Package Design for High Power Laser Arrays and Laser Diode ...

    For electrical isolation and interconnection ceramic substrates and hybrid microcircuit components manufactured in aluminum nitride or aluminum oxide are used. Thermal design of laser packages is of critical importance especially when considering the high density of laser emitters in …

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  • Aluminum Nitride Substrates - thomasnet.com

    Manufacturer & distributor of standard & custom aluminum nitride ceramic products including aluminum nitride substrates. Features include hexagonal crystal structure with covalent bonding dielectric properties high thermal conductivity low thermal expansion coefficient stable to high temperatures in inert atmospheres & non-reactive with normal semiconductor process chemicals & gases.

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  • US7060515B2 - Method of manufacturing a laser diode ...

    The substrate is soldered to the heat sink as is the laser diode bar. Due to the presence of the substrate at the lower end of the heat sink each individual laser diode package has its own electrical isolation. Several packages can be easily attached together to form a laser diode array.

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  • ATP - Laser Diode Submounts (Au/Sn)

    510.661.4287 Applied Thin-Film Products (ATP) offers build-to-print services for a wide range of materials and metalization schemes. ATP fabricates circuits on substrates using As-Fired Alumina Polished Alumina Aluminum Nitride Beryllium Oxide Fused Silica/Quartz Sapphire and Hi-K Dielectrics. ATP is one of the industry leader for Laser Diode Submounts with pre-deposited Au/Sn.

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  • 180~230W/M-K High Thermal Insulating Aln Aluminum Nitride ...

    The AlN is an ideal choice for heat dissipation substrate in electrical applications. It has high mechanical hardness high thermal conductivity similar thermal expansion coefficient with Si excellent electrical resistivity and good chemical stability. Besides Aluminium Nitride is non-toxic.

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  • US5835518A - Laser diode array packaging - Google Patents

    A method of packaging laser diode arrays includes the steps of forming a submount array having a plurality of submounts and an element for maintaining a precise spacing between the submounts; bonding the submounts to a substrate formed of an electrically insulating material; removing the element maintaining the precise spacing; and placing a diode bar in each of the precise spacings between ...

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  • China Aluminum Nitride Aluminum Nitride Manufacturers ...

    China Aluminum Nitride manufacturers - Select 2020 high quality Aluminum Nitride products in best price from certified Chinese Aluminum Steel manufacturers Aluminum Alloy Material suppliers wholesalers and factory on Made-in-China.com page 2 ... Metallized Aluminum Nitride Substrate for Laser Diode Array Manufacturing . FOB Price: US $ 1.5 ...

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  • US5040187A - Monolithic laser diode array - Google Patents

    Laser diode array fabrication is facilitated by provision of a monolithic substrate with one or more grooves of the same approximate depth and width as laser diodes secured therein. A metallization layer is provided in the grooves and the laser diodes secured in the grooves thereafter. Depending on the size of the original substrate being used for the laser array mount one or more submounts ...

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  • Metallized silicon substrates reduce LED costs Laser ...

    Metallized silicon substrates reduce LED costs. Commercial gallium nitride (GaN)-based light-emitting diodes (LEDs) are typically fabricated on expensive sapphire or silicon carbide substrates that are also difficult to dice and not easily scaled to the 300 mm and beyond large-diameter wafer sizes desired by manufacturers.

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  • US7864825B2 - Method and system for a laser diode bar ...

    A laser diode array is formed on a heat sink having an insulating layer in which a plurality of grooves is formed through the ceramic layer and to or into the heat sink. A laser diode stack is soldered to the ceramic layer. US7864825B2 - Method and system for a laser diode bar array assembly - …

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  • Aluminum Nitride Ceramic Substrates-Bonded Vertical Light ...

    We confirmed the potential of an aluminum nitride (AlN) substrate to be used as a bonding material for the high current operation of vertical light-emitting diodes (VLEDs).

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  • Alumina Substrates Alumina Wafers on Ceramic Substrates

    Valley Design East Phoenix Park Business Center 2 Shaker Road Bldg. E-001 Shirley MA 01464 Phone: 978.425.3030 Fax: 978.425.3031 Valley Design West Santa Cruz CA 95060

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  • Direct Bond Copper Substrates Remtec

    Remtec now offers cost effective and fast turnaround Direct Bond Copper (DBC) products on Alumina and Aluminum Nitride. Direct Bond Copper is a widely acceptable and a timeproven technology for power electronic products due to its high thermal conductivity high current capacity and heat dissipation of the high-purity copper on ceramic.

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  • Aluminium Nitride - LIANYUNGANG BAIBO NEW MATERIAL CO ...

    Metallized Aluminum Nitride Substrate for Laser Diode Array Manufacturing. FOB Price: US $1.5-15.5 / Piece. Min. Order: 100 Pieces. 180W High Thermal Conductivity Alumina Nitride Shaft Rod. FOB Price: US $25-150 / Piece. Min. Order: 10 Pieces. OEM Aln Alumina Nitride Ceramic Substrates …

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  • Aluminum Nitride Ceramic Substrates-Bonded Vertical Light ...

    We confirmed the potential of an aluminum nitride (AlN) substrate to be used as a bonding material for the high current operation of vertical light-emitting diodes (VLEDs).

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  • Ceramics aluminum nitride - Laser Focus World

    Articles news products blogs and videos covering the Buyer's Guide > Materials & Substrates > Ceramics aluminum nitride market.

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  • (PDF) Aluminum nitride substrates for ultraviolet light ...

    Currently wafers of aluminum nitride cut from bulk aluminum nitride crystals (AlN) grown by sublimation are considered promising substrates for obtaining light-emitting diode structures based on ...

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  • Package Design for High Power Laser Arrays and Laser Diode ...

    Copper and aluminum parts are used in the products as appropriate. A key skill is the design and sourcing of ultra high precision components that have the accuracy to achieve 6-axis alignment of laser arrays. To make this happen Intense has created an international supplier base of specialized metal component manufacturers.

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  • Analysis of Substrates for Single Emitter Laser Diodes ...

    The results present how greatly the substrate material can affect the very delicate laser diode. The ceramic substrates though having nearly the same properties exhibited clearly distinctive behavior and a great difference in thermal and mechanical performance. ... T. and Iwaida T. 1999 "Aluminum Nitride Packaging" Proc. Int. Symp ...

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  • Aluminium Nitride - LIANYUNGANG BAIBO NEW MATERIAL CO ...

    Metallized Ceramic Substrate with Alumina/Aluminum Nitride FOB Price: US $3.5-5 .5 / Piece. Min ... Metallized Aluminum Nitride Substrate for Laser Diode Array Manufacturing FOB Price: US $1.5-15 .5 / Piece ... Hot Products China Products Chinese Manufacturers/Suppliers China Wholesale Wholesale Price Industry Sites Regional Channels Product ...

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  • LASER AND PHOTO DIODE SUBMOUNTS - Remtec

    metal plugged vias in a ceramic substrate with high thermal and electrical conductivity. The plated copper vias' capability allows design and manufacture of hermetic integral substrate package with built‐in laser diode submounts and low dc resistance conductor traces.

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  • III Nitride Materials - an overview ScienceDirect Topics

    M.H. Kane N. Arefin in Nitride Semiconductor Light-Emitting Diodes (LEDs) 2014 4.1 Introduction. III-nitride materials possess a number of properties that are simply not accessible in any other semiconductors which will continue to make them an active area of …

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  • Microheat exchanger for laser diode cooling - Cooligy Inc.

    Method of fabricating an integrated circuit package having a liquid metal-aluminum/copper joint: August 1997: Layton et al. ... aluminum oxide (Al 2 O 3) and aluminum nitride (AlN). Oxygen and copper bond together under high temperature. ... In an exemplary application each pad is coupled to one of an array of laser diodes used in high power ...

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  • Manufacturable multi-emitter laser diode - Soraa Laser ...

    A multi-emitter laser diode device includes a carrier chip singulated from a carrier wafer. The carrier chip has a length and a width and the width defines a first pitch. The device also includes a p

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  • Thick Film Ceramic Substrates Anaren

    Standard thick-film substrates: 96% 99.5% and 99.6% alumina aluminum nitride and BeO quartz and fused silica and ferrites Turnkey Thick Film Solutions We provide turnkey thick film solutions up to 80 GHz employing a wide range of material choices design options processes and manufacturing …

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  • Gallium Nitride Materials and Devices XVI Conference Details

    A non-polar Fabry-Perot (FP) GaN laser has been demonstrated after the removal of its native free-standing GaN substrate which was achieved using a new laser fabrication method. Threshold current density of the m-plane laser was measured to be as low as 2.15 kA/cm2 and the operating wavelength is …

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  • III-nitride nanowires on unconventional substrates: From ...

    Currently the growth of nitride laser diodes has been demonstrated on several different substrates including sapphire GaN and Si with varying degrees of success primarily due to the dislocation issues related to lattice and thermal mismatch between nitrides and the substrates.

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  • Emtron Hybrids Inc.

    Aluminum Nitride (AIN) Higher Level ~ 7 Watts per inch per degree C. Printed thick film resistors range in value from 0.1 ohm to 300 megohm : Temperature Coefficient Resistance (TCR) as low as 50 ppm with tracking TCR's to 20 ppm : Power ratings range one-sixteenth (1/16) to five (5) Watts. Automated Laser Trimming of Resistors

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  • SemiGen Diode Submounts

    We have experience producing circuits utilizing substrates of varying thicknesses with high thermal conductivity such as alumina (Al) aluminum nitride (AlN) and beryllium oxide (BeO). SemiGen can deliver laser diode submounts with or without Au/Sn pads …

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  • Ceramics aluminum nitride - Laser Focus World

    Articles news products blogs and videos covering the Buyer's Guide > Materials & Substrates > Ceramics aluminum nitride market.

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  • (PDF) Pulsed laser deposition of aluminum nitride nanowires

    Aluminum nitride films have been deposited on Si(111) substrates at different substrate temperatures using two techniques; pulsed laser deposition or reactive magnetron sputtering.

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  • Aluminum Nitride - High Tech Material Solutions

    Aluminum Nitride Products Aluminium Nitride products have superior thermal conductivity high electric insulation and coefficient of thermal expansion similar to that of silicon (Si). High thermal conductivity about 7 times that of Alumina

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  • Nitrides - an overview ScienceDirect Topics

    Aluminum nitride (AlN) is receiving considerable attention both as a substrate and package material particularly for high-power hybrid microcircuits and high-density multichip modules. The key benefit in using aluminum nitride is its high thermal conductivity (170–200 watts/m K) combined with its excellent electrical and mechanical properties.

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  • (PDF) GaN substrates for III-nitride devices

    Bulk gallium nitride substrates for optoelectronic devices have been under. ... laser diode (LD); light-emitting diode ... metal and ammonia to form the nitride film at higher.

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  • Thermal crosstalk in arrays of III-N-based Lasers ...

    The impact of chip width substrate thickness thickness of p-type gold electrode number of emitters and emitter-to-emitter distance on output power limits of nitride laser diode is investigated ...

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  • Laser diode stack assembly and method of manufacturing ...

    What is claimed is: 1. A method of producing a laser diode stack assembly comprising: providing a plurality of laser diode bars having Anti-Reflective (AR) surfaces and High-Reflective (HR) surface; providing a plurality of electrically conducting spacers each of the spacers having a uppermost surface and a bottommost surface; forming an interlayered "sandwich" stack by arranging the ...

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  • Pricing Guide for Buying Laser Diodes

    A bare laser diode chip is simply a laser diode chip on a substrate ie aluminum nitride (AlN). This is the most basic commercially available laser form. However it isn't typically available to a single unit buyer since this is usually designed for volume OEM customers (i.e. someone purchasing 1000's and integrating into other systems).

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  • Laser diode and manufacturing method thereof - Hitachi Ltd.

    What is claim is: 1. A method of manufacturing a horizontal optical resonator type laser diode having an optical resonator horizontal with respect to a substrate surface comprising the steps of: providing a substrate of a semiconductor; forming an active layer inside the semiconductor; forming an optical resonator mirror on a facet of the semiconductor; and forming a first insulator film in ...

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  • Gallium Nitride Materials and Devices XVI Conference Details

    A non-polar Fabry-Perot (FP) GaN laser has been demonstrated after the removal of its native free-standing GaN substrate which was achieved using a new laser fabrication method. Threshold current density of the m-plane laser was measured to be as low as 2.15 kA/cm2 and the operating wavelength is …

    Get Price
  • An aluminium nitride light-emitting diode with a ...

    Wide-bandgap materials such as diamond2 and III–V nitride semiconductors (GaN AlGaN and AlN; refs 3–10) are potential materials for ultraviolet LEDs and laser diodes but suffer from ...

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  • Thick Film Ceramic Substrates Anaren

    Standard thick-film substrates: 96% 99.5% and 99.6% alumina aluminum nitride and BeO quartz and fused silica and ferrites Turnkey Thick Film Solutions We provide turnkey thick film solutions up to 80 GHz employing a wide range of material choices design options processes and manufacturing …

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  • Comparison of the thermal properties of polycrystalline ...

    Moreover the thermal resistance can be reduced further by 71% through replacement of the aluminum nitride substrate with diamond. The reliability of the diamond and AlN substrates was further ...

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  • Laser Cutting of Aluminum Nitride - ResearchGate

    Aluminum nitride (AlN) is beginning to replace alumina as a substrate and heat sink for electronic circuits. The thermal conductivity of AlN about 8 times that of alumina is the primary reason ...

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  • Analysis of Substrates for Single Emitter Laser Diodes ...

    The results present how greatly the substrate material can affect the very delicate laser diode. The ceramic substrates though having nearly the same properties exhibited clearly distinctive behavior and a great difference in thermal and mechanical performance. ... T. and Iwaida T. 1999 "Aluminum Nitride Packaging" Proc. Int. Symp ...

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  • TechNotes Ceramics Accu-Tech Laser Processing

    Excellent overall substrate material for cost effective manufacturing and laser processing. Typically represents over 90% of the microelectronics volume. Alumina 99+% Similar to 96%. Provides a superior surface for fabricating Thin Film circuitry. ALUMINUM NITRIDE Roughly equivalent in heat conductivity to Beryllia but the safety issue is avoided.

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  • Al-Rich III-Nitride Materials and Ultraviolet Light ...

    Aluminum nitride (AlN) material is commonly used as a crucial template for the growth of high-quality Al-rich III-nitride materials and high-performance deep-ultraviolet light-emitting diodes (DUV LEDs). In this chapter the heteroepitaxy of AlN film by MOVPE and the development of AlN epitaxy techniques on sapphire substrates are discussed.

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  • Methods of fabricating metal contact structures for laser ...

    Methods of fabricating a metal contact structure for a laser diodes are provided wherein the method comprises providing a UV transparent semiconductor substrate a UV transparent semiconductor epilayer defining a ridge disposed between etched epilayer edges the epilayer being disposed over the UV transparent semiconductor substrate and a UV opaque metal layer disposed over the epilayer ...

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  • Thin-Film Substrates for Microelectronics CoorsTek ...

    Substrate Materials • Size & Thickness • Lapping & Polishing • Laser Machining • Scribing & Annealing CoorsTek is the leader in custom and standard thin-film ceramic substrates. Four thin-film substrate material options combine smooth surface finish strong …

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  • International Workshop on Nitride Semiconductors (IWN2010 ...

    The illustration shows a model of a multi‐section laser diode with an absorber section in the center of the ridge emitting blue light pulses. The bottom left image is a true‐color photograph of such a laser diode being tested on‐wafer with a contact needle on the gain section. ... Aluminum nitride homoepitaxial growth on polar and non ...

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  • industrial ceramics thin thickness 1mm aluminum nitride ...

    Quick Details Model Number: Customized Type: Insulating Ceramics Material: Aluminum Nitride Purity: >95% Color: Grey Density: 3.3g/cm3 Water Absorption: 0% Moh's Hardness: 8 Thermal Conductivity: ≥175w/mk Coefficient of Thermal Expansion: 4.6 x 10^-6 Volume Resistivity: >10^13Ω.cm Dielectric Strength: 17 Product Description Product Name Industrial Ceramics Thin Thickness 1mm Aluminum Nitride...

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  • Laser Diode Bar Stress - Solid State Lasers and Laser ...

    While this is most certainly an issue in all diode soldering the sear size of a laser diode bar leads to an increased risk of a stress gradient forming across the length of the bar. For example based on the difference in CTE between a 10mm GaAs diode bar and a copper heat sink the difference in expanse can be greater than 10 microns.

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  • US Patent for Method and structure for manufacturable ...

    The present disclosure provides a method and structure for producing large area gallium and nitrogen engineered substrate members configured for the epitaxial growth of layer structures suitable for the fabrication of high performance semiconductor devices. In a specific embodiment the engineered substrates are used to manufacture gallium and nitrogen containing devices based on an epitaxial ...

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  • Metal Core PCB HIT AD and SN Plates Tech-LED

    Metal Core PCB Substrates. To integrate your unpackaged LED die or SMD MARUBENI-OPTO™ products include a variety of solutions including metal-core PCBs that can be printed and etched to your circuit schematic/layout or advanced substrate designs that can be used for thin or thick film defined circuitry.Our ceramic products include aluminum nitride which is approximately 7X more thermally ...

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  • III-nitride nanowires on unconventional substrates: From ...

    Currently the growth of nitride laser diodes has been demonstrated on several different substrates including sapphire GaN and Si with varying degrees of success primarily due to the dislocation issues related to lattice and thermal mismatch between nitrides and the substrates.

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  • UVC-LED Ultra-violet (UV) C band Gallium Nitride Epitaxy Wafer

    XRCS for GaN - LED wafers grown on an LSAT substrate and growing on a GaO2 substrate with optimized growth conditions for high-performance gallium nitride epitaxial LED chips. [Sources: 9] In previous work 22 we have just reported the first GaN light-emitting diode structures (LEDs) that have grown on a silicon substrate.

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  • Remtec Expands Power Transfer Via (PTV) Technology To DBC ...

    The added values of Remtec's new DBC alumina and Aluminum Nitride ceramics with PTV ® vias are higher connectivity and circuit density as well as a high current carrying capacity. Remtec's new Power Transfer Vias for DBC substrates are hermetic to 10 -8 and have a low dc resistance of 1-5 milliohm per via depending on a via size and ...

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  • About Us Stellar Industries

    Stellar is also working on developing cold plates for high power laser cooling applications that can be used in stacked arrays. Versions in both Aluminum Nitride and Beryllium Oxide are being developed. As an AS9100D:2016 ISO 9001:2015 certified Company Stellar is dedicated to meeting your requirements for power ceramic substrates and packages.

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  • Fabrication and Characterization of Aluminum Nitride ...

    Aluminum nitride nanoparticles (AlN-NPs) were fabricated by a RF magnetron sputtering and inert gas condensation technique. By keeping the source parameters and sputtering time of 4 h fixed it was possible to produce AlN-NPs with a size in the range of 2–3 nm. Atomic force microscopy (AFM) Raman spectroscopy X-ray diffraction (XRD) and UV-visible absorption were used to characterize the ...

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  • Applications of Aluminum Nitride (AlN) Ceramics Request PDF

    Aluminum nitride (AIN) an attractive candidate for the high performance substrate of the next generation has been developed and metallization techniques have also been advanced.

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  • IEEE Account - IEEE Xplore

    Aluminum Nitride-An Alternative Ceramic Substrate for High Power Applications in Microcircuits. ... very large-scale integration (VLSI) and laser diodes requires new packaging schemes with improved thermal management. From the limited number of some ten nonmetallic inorganic solids known from the literature to have thermal conductivities grea ...

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  • (PDF) Ultraviolet laser diodes on sapphire and A1N substrates

    Although existing manufacturing technology is less mature than for sapphire and silicon carbide substrates aluminum nitride has been demonstrated to be superior for deep UV light-emitting ...

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  • Aluminum Nitride Ceramic PCB Hitech Circuits Co. Ltd.

    The product is widely used in electronic packaging with stable performance and reliable quality. We can customize all kinds of ceramic printed circuit board various sizes various shapes various substrate (aluminum nitride alumina monocrystalline silicon) various line spaces and various proceeds (Electroplating MEMS Thick film Printing).

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  • High Power LED Chip Array Packaging - Medical Design Briefs

    Insulated Metal Substrate (IMS) with a copper core and 5 mil nickel/gold plated copper traces. Aluminum Nitride Substrate (ALN) with 5 mil nickel/gold plated copper traces. (Note that Beryllia (BeO) ceramic is an exceptionally high thermally conductive substrate material but because of its toxicity issues was not considered for this study).

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  • Laser diode stack assembly and method of manufacturing ...

    What is claimed is: 1. A method of producing a laser diode stack assembly comprising: providing a plurality of laser diode bars having Anti-Reflective (AR) surfaces and High-Reflective (HR) surface; providing a plurality of electrically conducting spacers each of the spacers having a uppermost surface and a bottommost surface; forming an interlayered "sandwich" stack by arranging the ...

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  • Recent progress of research on III-nitride deep ...

    III-nitride based ultraviolet light-emitting diodes (UV LEDs) have recently attracted more and more attention for their great potential in a wide range of applications such as water and air purification disinfection polymer curing biochemical detection non-line-of-sight communications and special lighting. The bandgaps of GaN AlN and InN are 3.43 6.04 and 0.65 eV respectively which ...

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  • Gallium nitride (GaN) on sapphire substrates for visible ...

    3.1. Introduction. The III-nitride (III-N)-based visible blue and green light-emitting diodes (LEDs) currently in production are predominantly (more than 90% as of the time of writing) manufactured on sapphire substrates with a gallium nitride (GaN) buffer layer.

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  • Advanced Laser Microfabrication of Ceramics and Sapphire ...

    their implementation in high-volume manufacturing plat-forms are discussed. Applications results with the QCW fiber laser were obtained for ceramics such as alumina and aluminum ni-tride and sapphire. Alumina (polycrystalline Al 20 3) and aluminum nitride (AlN) are considered high performance thermal conducting substrates and are used on a large

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  • Gallium Nitride on Sapphire Substrate (GaN) epitaxial ready

    Gallium Nitride (GaN) Epitaxial Grown on Al2O3 Substrates. GaN is a binary III/V direct bandgap semiconductor commonly used in bright light-emitting diodes since the 1990s. The compound is a very hard material that has a Wurtzite crystal structure.Its wide band gap of 3.4 eV affords it special properties for applications in:. optoelectronic

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  • Laser Diode Emits Deep UV Light - Tech Briefs

    The team used a high-quality aluminum nitride (AlN) substrate as their base for building up the layers of the laser diode. This they say is necessary since lower quality AlN contains a large number of defects which ultimately impact the efficiency of a laser diode's active layer in …

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  • Substrates in Northern California (CA) on Thomasnet.com

    Welcome to the premier industrial source for Substrates in California - Northern. These companies offer a comprehensive range of Substrates as well as a variety of related products and services. ThomasNet.com provides numerous search tools including location certification and keyword filters to help you refine your results.

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  • Aluminum nitride as a new material for chip-scale ...

    Then as illustrated in figure 6(a) amplified pump light from a CW telecom tunable diode laser source is launched into the waveguides from the left to excite a TM-like guided optical mode. A power monitor port for the pump light (center) and a detection port for 775 nm light (right coupler) are split out near the output end of the waveguides.

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  • Methods for improved growth of group III nitride ...

    Methods are disclosed for growing high crystal quality group III-nitride epitaxial layers with advanced multiple buffer layer techniques. In an embodiment a method includes forming group III-nitride buffer layers that contain aluminum on suitable substrate in a processing chamber of a hydride vapor phase epitaxy processing system.

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  • Indium Gallium Aluminium Nitride (InGaAlN) Semiconductors

    Indium gallium aluminum nitride is generally prepared by epitaxial methods like pulsed-laser deposition molecular beam epitaxy etc. Addition of indium to the gallium nitride to form the light-emitting layer leads to the emission of ultraviolet and visible lights.

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  • Ceramic Laser Components - Accuratus

    Materials of construction include beryllium oxide and aluminum nitride. Metallized surfaces can be supplied with thick film deposited conductors or thin film conductors. Additionally small metallized submounts in aluminum oxide are produced to support the photodetectors used for feedback control in packaged laser systems.

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  • Pricing Guide for Buying Laser Diodes

    A bare laser diode chip is simply a laser diode chip on a substrate ie aluminum nitride (AlN). This is the most basic commercially available laser form. However it isn't typically available to a single unit buyer since this is usually designed for volume OEM customers (i.e. someone purchasing 1000's and integrating into other systems).

    Get Price
  • GaN SubstrateGallium NitrideEpi ServiceSilicon Wafer ...

    PAM-XIAMEN's Template Products consist of crystalline layers of gallium nitride (GaN) aluminum nitride (AlN)aluminum gallium nitride (AlGaN)and indium gallium nitride (InGaN) which are deposited on sapphire substrates silicon carbide or silicon.PAM-XIAMEN's Template Products enable 20-50% shorter epitaxy cycle times and higher quality epitaxial device layers with better structural quality ...

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  • Single crystal GaTe Substrate - XIAMEN POWERWAY

    2 INCH ALUMINUM NITRIDE ALN TEMPLATE ON SAPPHIRE PAM XIAMEN offers 2 inch Aluminum Nitride AlN Template on sapphire. 2 INCH ALUMINUM NITRIDE ALN TEMPLATE ON SAPPHIRE (0001) SEMI-INSULATING TYPE 4000~5000NM Conductivity type: Semi-insulating AlN Substrate: Sapphire Dimension: Φ50.8 mm ± 0.1 mm Thickness: 4 ~ 5 um (4000~5000 nm) Edge Exclusion Zone: < 2 mm …

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  • Laser Micro Hole Drilling Laser Light Technologies

    Laser drilling is a highly adaptable versatile and reliable micromanufacturing process used in a broad range of industries. We work closely with you to customize our laser manufacturing and post-laser processing to match your unique drilling needs optimizing applications including: micro holes hole arrays blind wells and specialized portals.

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  • Epo-Tek H20S Adhesive - EMSDIASUM

    Based on standard method: Laser flash: Thermal Conductivity: 25 W/mK Based on thermal resistance data: R = L x K-1 x A-1: Thermal Resistance (Junction to Case) TO-18 package with nickel-gold metallized 20 x 20 mil chips and bonded with EPO-TEK® H20E (2 mils thick) Epo-Tek® H20E: 6.7 …

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  • 25G DFB Laser Diode Chip - 44329099

    25G DFB Laser Diode Chip. 1310 nm Distributed Feed-Back (DFB) laser diode chip for 25 Gb/s operation. It is designed for use in the dry N2 hermetic sealed package. Supplier. Oclaro Inc. (Nasdaq: OCLR) is a leader in optical components modules and subsystems for the core optical enterprise and data center and wireless access markets.

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  • HYPERION : GROUP - Gold Chip Space Technology Space ...

    Active base Adhesion adhesion promoter Ag see silver Air annealing air firing Al aluminum aluminum deposition aluminum etch aluminum film aluminum metallization aluminum sputtering AlN Aluminum nitride metallized substrate Al2O3 aluminum oxide alumina Alloying Ammonium fluoride etching solution Amorphous silicon a:Si Anisotropic ...

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  • GANEXT - GaN for Electronics & Optoelectronics

    aluminium nitride (AlN)/sapphire templates. For this purpose the structural and electro-optical properties ... microdisk laser diodes University of Science and Technology Beijing Beijing 100083 China ... in diameter micro-light-emitting diode (μLED) arrays with the parallel configuration including 2×2 2×3

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  • Remtec Expands Power Transfer Via (PTV) Technology To DBC ...

    The added values of Remtec's new DBC alumina and Aluminum Nitride ceramics with PTV ® vias are higher connectivity and circuit density as well as a high current carrying capacity. Remtec's new Power Transfer Vias for DBC substrates are hermetic to 10 -8 and have a low dc resistance of 1-5 milliohm per via depending on a via size and ...

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  • Fundamentals of Gallium Nitride Power Transistors

    manufacturing utilizes standard CMOS tools to fabricate their devices. EPC's process begins with silicon wafers. Using an MOCVD reactor a thin layer of aluminum nitride (AlN) is grown on the silicon to transition the crystal from silicon to GaN. This is a seed layer used to grow a thick layer of highly resistive GaN on the silicon wafer. GaN is

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  • Aluminum Nitride Aln Ceramic Plate For Electronic ...

    The Aluminum Nitride(AlN) ceramic has high thermal coductivity(5-10 times as the Alumina ceramic) low dielectric constant and dissipation factor good insulation and excellent mechanical properties non-toxic high thermal resistance chemical resistance and the linear expansion cofficient is similar with Si which is widely used in communication compents high power led power electronic ...

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  • Aluminum Nitride (AIN) Nanoparticles MOLCHEM

    Aluminum nitride can be found in large shapes thin substrate or in powder form. The characteristics of Aluminum nitride are even more effective in the form of nanoparticles. Therefore in this article we aim to discuss the properties applications and potential of Aluminum nitride nanoparticles for future use.

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  • China High Thermal Conductivity Aluminium Nitride Ceramic ...

    High Thermal Conductivity Aluminium Nitride Ceramic Aln Insulation Aluminum nitride ceramic substrate high thermal conductivity low coefficient of expansion high strength high temperature resistance chemical resistance high resistivity low dielectric loss is the ideal LSI heat dissipation board and packaging materials.

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  • China Industrial High Heat Dissipation Aln Ceramic Wafer ...

    The description of AlN ceramic wafers and substrate The Aluminum nitride ceramic wafer has a high thermal conductivity of more than 170W/m. K high resistivity low dielectric loss good insulation and some other excellent properties.

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  • Catalog Update - Microwave Journal

    This catalog features Hi-Therm™ aluminum nitride a high priority ceramic with superior microstructural and chemical uniformity that results in very consistent properties. Hi-Therm is best suited for heat sink power transistor module high frequency device and laser diode submount applications.

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  • Defect reduction in seeded aluminum nitride crystal growth ...

    Abstract. Bulk single crystal of aluminum nitride (AlN) having an areal planar defect density.ltoreq.100 cm.sup.-2. Methods for growing single crystal aluminum nitride include melting an aluminum foil to uniformly wet a foundation with a layer of aluminum the foundation forming a portion of an AlN seed holder for an AlN seed to be used for the AlN growth.

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    Discrete VCSEL devices and VCSEL arrays are also packaged for commercial sale in metal TO-56 (CD-laser) packages TO-8 cans 20-pin ceramic sidebraze DualIn-Lin (DIP) packages on thermo-electric coolers and together with driver integrated circuit electronics on alumina and/or aluminum nitride hybrid circuit substrates. 5.

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  • Report Forecasts Increasing Demand for Advanced Substrates ...

    Posted: May 26 2009: Report Forecasts Increasing Demand for Advanced Substrates for Gallium Nitride Devices (Nanowerk News) Over the past 15 years the availability of high quality sapphire and silicon carbide substrates has enabled the rapid growth of the gallium nitride device (mainly high-brightness LED) market to $4.6 billion in 2008.However according to Strategies Unlimited's recently ...

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  • Japanese Journal of Applied Physics Volume 58 Number SC ...

    This paper reports two inch gallium nitride (GaN) substrates fabricated from bulk GaN crystals grown in the near equilibrium ammonothermal method. 2'' GaN wafers sliced from bulk GaN crystals have a full width half maximum of the 002 X-ray rocking curve of 50 arcsec or less a dislocation density of mid-10 5 cm −2 or less and an electron density of about 2 × 10 19 cm −3. The high electron density is attributed …

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  • Valley Design About Us

    Many substrates of various materials are also in stock. History Valley Design was incorporated in 1975 with the mission of developing and designing unique manufacturing processes of materials shaping of Ceramics Silicon Germanium Glass and Quartz for the semiconductor and hybrid circuit industries.

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  • Nanomaterials Free Full-Text Heteroepitaxial Growth of ...

    High-quality and crack-free aluminum nitride (AlN) film on sapphire substrate is the foundation for high-efficiency aluminum gallium nitride (AlGaN)-based deep ultraviolet light-emitting diodes (DUV LEDs). We reported the growth of high-quality and crack-free AlN film on sapphire substrate with a nanometer-scale-thick AlN nucleation layer (NL).

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  • HDI PCB: Design Guidelines and Manufacturing Process

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  • GaN-Ready Aluminum Nitride Substrates for Cost-Effective ...

    OSTI.GOV Technical Report: GaN-Ready Aluminum Nitride Substrates for Cost-Effective Very Low Dislocation Density III-Nitride LED's

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  • Alumina Wafers for research & production

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    The substrate with dimensions 1.9 in. by 2 in. is mounted in a fluid cooled block at one end. To test this cooling architecture and verify the accuracy of thermal models the authors constructed thermal test modules using alumina (Al{sub 2}O{sub 3}) aluminum nitride (AlN) and CVD diamond substrate …

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  • Micromachines Special Issue : Laser Micro- and Nano ...

    A minimum roughness of 1.5 μm for alumina and 1.65 μm for aluminum nitride can be accomplished for medium pulse overlaps (42% to 56%). In addition ablation depth deviation of the micromachining process of smaller than 8% for alumina and 2% for aluminum nitride are achieved.

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  • III-Nitride Devices and Nanoengineering

    The group III nitrides including gallium nitride aluminum nitride and indium nitride (InN) represents a formidable group of semiconductors with a high impact in optoelectronics. This is primarily due to their direct bandgaps that span a wide spectral range with the …

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  • Fiber Laser Sources & Solutions IPG Photonics

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  • Dendritic Nanowire Ultraviolet Laser Array Journal of ...

    Self-organized dendritic crystal growth is explored to assemble uniform semiconductor nanowires into highly ordered one-dimensional microscale arrays that resemble comb structures. The individual ZnO nanowires have uniform diameters ranging from 10 to 300 nm. They are evenly spaced on a stem with a regular periodicity of 0.1−2 μm. Under optical excitation each individual ZnO nanowire ...

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  • The Effect of Laser Beam Geometry on Cut Path Deviation in ...

    The Effect of Laser Beam Geometry on Cut Path Deviation in Diode Laser Chip-Free Cutting of Glass Salman Nisar ... Modeling the Effects of Laser Beam Geometry on Laser Surface Heating of Metallic Materials" ... Improved Method of C O 2 Laser Cutting of Aluminum Nitride. J. Electron. Packag (June2008)

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  • HDI PCB: Design Guidelines and Manufacturing Process

    Although the cost of laser drilling equipment is high they have higher precision as well as stable and mature technology. The advantages of laser technology make it the most commonly used method in blind/buried through hole manufacturing. Today 99% of HDI microvias are obtained by laser drilling. 2nd. Through metallization

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  • Zinc oxide light-emitting diodes: a review

    3.1. Structure of ZnO. The structure of crystalline ZnO was investigated as far back as in 1935. 6 ZnO crystallizes with the Wurtzite structure (a hexagonal crystal structure often adopted by binary sulphides and oxides). In this crystalline form zinc ions Zn 2 + are found on the sites of a hexagonal close packed sublattice interpenetrated by a similar lattice populated with oxygen ions O 2 −.

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  • Dr. Takashi Mukai Profile - spiedigitallibrary.org

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  • Additive Manufacturing & 3D Printing AMERICAN ELEMENTS

    Direct Metal Deposition is an additive manufacturing technology using a laser to melt metallic powder. The laser beam and the powder spray are focused and scan the substrate to deposit the metal. Unlike most other technologies it is not based on a powder bed but relies on a feed nozzle to propulse the powder into the laser beam.

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  • Preparation and Characterization of Aluminum Nitride ...

    Preparation and Characterization of Aluminum Nitride Nanorod Arrays via Chemical Vapor Deposition Jian Yang1 Ting-Wei Liu1 Chi-Wei Hsu2 ... It makes to perspective use MBE with ammonia at manufacturing ... substrates Al2O3 (0001) is presented. The experiments were carried out on the installation Riber-

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  • Growth of III-nitride photonic structures on large area ...

    on large area 6 in. diameter silicon 111 substrates by metal organic chemical vapor deposition. We have demonstrated the feasibility of growing crack-free high quality III-nitride photonic structures and devices on 6 inch Si substrates through the fabrication of blue light emitting diodes

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  • DOE Patents Patent: Growth of large aluminum nitride ...

    In various embodiments non-zero thermal gradients are formed within a growth chamber both substantially parallel and substantially perpendicular to the growth direction during formation of semiconductor crystals where the ratio of the two thermal gradients (parallel to …

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  • Thick-Film Substrates for Microelectronics CoorsTek ...

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    approaches. Using a wide array of ceramic substrate materials and metal systems combined with advanced thin film manufacturing features and capabilities the circuit designer can now easily reduce circuit size and parts count over traditional thin film substrate …

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  • Gallium Nitride: Novel Material for the New Millenium

    Washington - Jan. 17 2001 - Ever wanted a light bulb that lasts up to 10 years a blue laser that will quadruple the storage capacity of a compact disc or aerospace components that can operate over a wide temperature range and remain unaffected by radiation. Then a remarkable kind of semiconducting material made from gallium nitride and its close chemical cousins: aluminum nitride …

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  • Effect of Heat Treatment of Al Substrate on GaN Film ...

    The substrate effect of various aluminum compounds such as aluminum nitride (AlN) [41] [42] aluminum gallium nitride (AlGaN) [43] [44] and aluminum oxide (γ–Al 2 O 3) [45] which can improve the crystallinity of GaN has been studied and reported by many researchers [46] [47]. High-quality GaN have been grown on Al-based intermediate layers.

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  • Studies on the Reliability of Ni-Gate Aluminum Gallium ...

    On SiC substrates a nucleation layer of Aluminum Nitride (AlN) is employed to aid in epitaxial growth and to reduce conduction through the substrate. A buffer layer of GaN is grown on the substrate via Metal Organic Chemical Vapor Deposition (MOCVD) to a thickness of generally a few microns.

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  • Gallium Nitride-Based Nanowire Radial Heterostructures for ...

    III-nitride nanowires for solar light harvesting: A review. Renewable and Sustainable Energy Reviews 2017 79 1002-1015. DOI: 10.1016/j.rser.2017.05.136. Miao-Rong Zhang Qing-Mei Jiang Shao-Hui Zhang Zu-Gang Wang Fei Hou Ge-Bo Pan. Fabrication of gallium nitride nanowires by metal-assisted photochemical etching.

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  • Prof. Arto V. Nurmikko Profile

    Proc. SPIE. 10918 Gallium Nitride Materials and Devices XIV. KEYWORDS: Mirrors Near ultraviolet Etching Ultraviolet radiation Reflectivity Doping Scanning electron microscopy Gallium nitride Vertical cavity surface emitting lasers Absorption ... II-VI Blue/Green Laser Diodes. Conference Committee Involvement (1) II-VI Blue/Green Laser ...

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  • Dr. Tadeusz Suski Profile - spiedigitallibrary.org

    KEYWORDS: Light sources Quantum wells Optical amplifiers Chemical species Indium Laser development Interferometry Semiconductor lasers Gallium nitride Optical clocks Read Abstract + consumption and financial burden of the multiple light sources required for such systems.

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  • Nitride Semiconductor Light-Emitting Diodes (LEDs) Second ...

    Nitride Semiconductor Light-Emitting Diodes (LEDs): Materials Technologies and Applications Second Edition reviews the fabrication performance and applications of the technology encompassing the state-of-the-art material and device development along with considerations regarding nitride-based LED design. This updated edition is based on the latest research and advances including two new ...

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  • (8) Aluminum nitride-on-sapphire platform for integrated high-Q microresonators optics express 2017 (9) Characteristics of III-nitride based laser diode employed for short range underwater wireless optical communications Optics Communications 2017

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  • Aluminum Silicon Nitride Products & Suppliers ...

    Description: Nitrides are compounds of nitrogen with metals. They are usually characterized by a high degree of thermal stability and exceptional chemical stability. In addition to saline and metallic nitrides there are also covalent nitrides such as aluminum nitride boron . Shape / Form: Fabricated / Custom Shape Spout / Nozzle (Launder Pouring / Atomization) Roller / Roll

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  • Future Value Partner - toshiba-tmat.co.jp

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  • Methods for improved growth of group III nitride ...

    Methods are disclosed for growing high crystal quality group III-nitride epitaxial layers with advanced multiple buffer layer techniques. In an embodiment a method includes forming group III-nitride buffer layers that contain aluminum on suitable substrate in a processing chamber of a hydride vapor phase epitaxy processing system.

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  • Aluminum nitride nanowire light emitting diodes: Breaking ...

    Aluminum gallium nitride (AlGaN) has attracted significant attention for deep ultraviolet (DUV) light emitting diodes (LEDs) and laser diodes (LDs) 12345678910111213141516171819 ...

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  • Alumni: Purdue University

    "Zirconium nitride/aluminum nitride buffer layers for epitaxial growth of (indiumgallium) ... "Growth and characterization of metal‐semiconductor nitride multilayers and superlattices for ... "Hexagonal prism blue laser diode using whispering gallery mode resonances toward reduced ...

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  • Advanced Packaging & Interconnects Coherent

    They are also used to process fired substrates such as alumina (AL2O3 ) aluminum nitride (AIN) and beryllium oxide (BeO) and unfired (green) substrates. Coherent's DIAMOND sealed CO 2 lasers AVIA diode-pumped UV lasers and VECTOR diode-pumped solid-state lasers have become industry benchmarks for laser ceramics processing.

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  • Compound Semiconductor Wafers and Substrates MSE ...

    A compound semiconductor is a single crystal semiconductor material composed of two or more different elements. Binary compound semiconductors are made from many elements; for instance SiC binds two group IV elements but many can be recognized as elemental pairs taken from either side of the Group IV elements. Some of the widely used compound semiconductors include GaN AlN InSb and …

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  • III-Nitride Semiconductor Nanowires - Novel Materials for ...

    In addition to single nanowire devices ensembles of nanowires can also be leveraged in interesting and advantageous ways. At Sandia Dr. Wang and colleagues have developed a technique that uses vertically aligned GaN nanowire arrays as a high quality template for the growth of high quality GaN films on inexpensive lattice-mismatched substrates as shown in Figure 3. 12 The nanowires serve as ...

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  • Patents Assigned to Tokuyama Corporation - Justia Patents ...

    Abstract: A silicon-doped n-type aluminum nitride monocrystalline substrate wherein at a photoluminescence measurement at 23° C. a ratio (I1/I2) between the emission spectrum intensity (I1) having a peak within 370 to 390 nm and the emission peak intensity (I2) of the band edge of aluminum nitride is 0.5 or less; a thickness is from 25 to ...

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  • ALPHABETICAL INDEX TO THE COMMERCE CONTROL LIST ...

    Commerce Control List - Index Supplement No. 1 to part 774 - Index 3 Description ECCN Citation Export Administration Regulations Bureau of Industry and Security January 9 2012

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  • lSemiconductor Today News

    Semiconductor laser start-up Vector Photonics Ltd (which was spun off from Scotland's University of Glasgow in March) is leading the £1.5m project BLOODLINE (Bright Laser diOdes fOr aDvance metaL addItive maNufacturing systEms) an international consortium – funded by UK Government agency Innovate UK (which provides funding and support for ...

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  • Nanoparticles & Nanomaterials AMERICAN ELEMENTS

    Brief History of Nanotechnology. In his famous talk entitled "There's Plenty of Room at the Bottom" Richard Feynman set the stage for research into applied nanoscience.The speech which was delivered on December 29th 1959 at the annual meeting of the American Physical Society at the California Institute of Technology marked a revolution in the way the scientists looked at materials ...

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  • Fundamentals of Gallium Nitride Power Transistors

    manufacturing utilizes standard CMOS tools to fabricate their devices. EPC's process begins with silicon wafers. Using an MOCVD reactor a thin layer of aluminum nitride (AlN) is grown on the silicon to transition the crystal from silicon to GaN. This is a seed layer used to grow a thick layer of highly resistive GaN on the silicon wafer. GaN is

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  • Fabrication technology for high light-extraction ...

    AlGaN ultraviolet light-emitting diodes (UV LEDs) and ultraviolet laser diodes in the range of 265–280 nm are needed to develop novel disinfection and sterilizing technologies (water air and surfaces) to improve access to clean water [1–4] improve public health [5 6] and enable other biotech applications [7–10].UV LEDs are a viable technology for replacing mercury gas discharge ...

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  • Accuratus Corporation Phillipsburg New Jersey NJ 08865

    November 2 2009 - Accuratus is offering high thermal conductivity aluminum nitride substrates for difficult thermal management applications. Thermal conductivity exceeds 170 watts per meter kelvin at room temperature. The substrates are offered in industry standard thicknesses of …

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